大口径立式炉

VFS大口径立式炉

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2021-10-01 10:39:07
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安捷来国际股份(香港)有限公司

安捷来国际股份(香港)有限公司

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大口径立式炉:Flagshipmodelthathasachievedsemiconductorspecification

详细介绍

大口径立式炉:

  • Flagship model that has achieved semiconductor specification.
  • The semiconductor diffusion furnace has been modified to a larger scale For the flat panel display.
  • Various kinds of process are available such as vacuum, various kinds of Gas atmosphere (Oxidization, reduction, neutral, & corrosion etc).
Available glass size ~W730×L920mm
Temperature rangeRT~700℃
Temperature uniformity±3℃
CleanlinessClass 1 (0.3μm)
Applications Re-polyimide, Annealing, Baking

上一篇:石膏板硬度测定试针及辅具的技术参数及概述 下一篇:絮凝剂用量越来越多的原因简析
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