单片IR式净化烧成炉

CCBS-IR单片IR式净化烧成炉

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2021-10-01 10:35:23
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安捷来国际股份(香港)有限公司

安捷来国际股份(香港)有限公司

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单片IR式净化烧成炉:CleanstructurewithnodustcausedbyitselfFar-infraredradiation(IR)heatingsystemhasbeenadopted

详细介绍

单片IR式净化烧成炉:

  • Clean structure with no dust caused by itself
  • Far-infrared radiation(IR) heating system has been adopted.
    The process with high efficiency is available for various kinds of the film thickness.
  • The IR panel heater with excellent temperature uniformity has been adopted.
  • The uniform heating is available for such a large substrate as the 10th Generation.
  • By introducing N2 gas into the oven, it is available to have a heating process under low Oxygen(O2) density.
Available glass size ~W3000×L3200mm
Temperature range80~250℃
Temperature uniformity±3℃
CleanlinessClass 10 (0.3μm)
Applications Baking of Polyimide coating, Annealing,
Baking of passivation film, Seal main curing/pre curing

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