产品特点

产品参数

产品介绍

The Advanced ALD system is a viscous flow-type reactor for ultra thin film deposition. The growth process is controlled by a Windows-based software package. The base model is equipped with two gas lines and handles wafer size up to 12 ". With a compact footprint, all hardware is enclosed in a negative pressure cabinet for safety more information.

 

 

产品参数

Operation Vacuum: 1 Torr to UHV 

2 Heated Gas Lines (can be expanded to 12)

Gas injection mode: bubbler and direct draw

Sample size: up to 4 in standard, optional 12in

Substrate heater: up to 500°C, optional higher temp

 

 

产品介绍

Applications

High k dielectrics

Nanocoatings

Surface modification layers

Device encapsulations

Photonic crystals

Optional add-on components

Remote plasma source

Ozone delivery system

Quartz crystal monitor

Quadruple mass spectrometer

Real-time temperature monitor

Ellipsometer

LoadLock